According to revelations by foreign blogger yeux1122, Apple is currently testing a new anti-reflection optical coating technology designed to reduce lens flares and ghosting, thus enhancing photo quality.
Based on supply chain sources, Apple is contemplating the introduction of new Atomic Layer Deposition (ALD) equipment into the iPhone camera lens manufacturing process.
Atomic Layer Deposition is a thin film deposition technique based on the continuous use of gas-phase chemical processes, wherein materials are deposited in the form of monolayers on the substrate surface layer by layer. ALD is a nanotechnology that enables the deposition of ultra-thin films at the nanometer scale with precise control.
In the realm of camera lenses, ALD (Atomic Layer Deposition) technology is primarily employed to apply anti-reflective coatings, aiding in reducing photographic artifacts. For instance, when intense light sources such as the sun directly hit the lens, it can lead to the appearance of stripes and halos in captured images, whereas ALD techniques can mitigate these image distortion phenomena.
Furthermore, the materials used in ALD applications can also protect camera lens systems from environmental damage without compromising the sensor's ability to effectively capture light.
The blog post indicates that Apple plans to apply this technology to the Pro models of the iPhone, possibly appearing in either the iPhone 16 Pro series or next year's iPhone 17 Pro series.
Editor's Note:
iPhone users have long been plagued by various issues caused by light reflection, such as glare and ghosting. Apple's development of this new technology holds the promise of improving photo quality, reducing glare and pseudo-images, and providing users with a better shooting experience.
If successfully implemented on the iPhone, it will further solidify Apple's leading position in the smartphone photography field.
